

The Preciomo Udx® MOCVD system is engineered for high-volume Micro-LED manufacturing. Configurable with two independently controllable reactors, the system can accommodate up to 18x6" or 12x8" GaN-based Micro-LED epitaxial growth simultaneously. The dual-rotation wafer carrier with horizontal gas flow architecture ensures exceptional wavelength uniformity and production stability. Integrated IC industry standard EFEM and SMIF systems, achieving fully automated cassette-to-cassette wafer transfer and effectively reducing particle generation. Relying on its superior wavelength uniformity,low defect density and high production stability, the Preciomo Udx® MOCVD system fulfills the strict technical requirements and facilitates the Micro-LED mass production.

MOCVD solution for GaN based Micro-LED production
Key equipment for GaN-based Micro-LED production
Multi-wafer reactor with horizontal gas flow, 6"/8"compatible
Compact footprint with friendly maintenance
Model-based temperature control
Automatic transfer system compliant with IC industry standard
Industry-leading throughput
Exceptional wavelength and thickness uniformity with low defect density
Fully automated cassette-to-cassette transferring with high efficiency
User friendly software interface for intuitive operation
Customization and factory automation (FA) available