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The Preciomo Udx® MOCVD system is engineered for high-volume Micro-LED manufacturing. Configurable with two independently controllable reactors, the system can accommodate up to 18x6" or 12x8" GaN-based Micro-LED epitaxial growth simultaneously. The dual-rotation wafer carrier with horizontal gas flow architecture ensures exceptional wavelength uniformity and production stability. Integrated IC industry standard EFEM and SMIF systems, achieving fully automated cassette-to-cassette wafer transfer and effectively reducing particle generation. Relying on its superior wavelength uniformity,low defect density and high production stability, the Preciomo Udx® MOCVD system fulfills the strict technical requirements and facilitates the Micro-LED mass production.

Preciomo Udx®

MOCVD solution for GaN based Micro-LED production

Products Features

Key equipment for GaN-based Micro-LED production

Multi-wafer reactor with horizontal gas flow, 6"/8"compatible

Compact footprint with friendly maintenance

Model-based temperature control

Automatic transfer system compliant with IC industry standard

Competitive Advantages

Industry-leading throughput

Exceptional wavelength and thickness uniformity with low defect density

Fully automated cassette-to-cassette transferring with high efficiency

User friendly software interface for intuitive operation

Customization and factory automation (FA) available

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